Tomoyuki Kikutani, Nobuyuki Aoki, Akio Oki, Chulun Hong, Hidenobu Hori, Syoji Yamada
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers 35(12 B) 6347-6695 1996年12月
We have fabricated split-gate quantum wires having a buried ferromagnetic dot, by successively utilizing electron-beam (EB) and two-step scanning tunneling microscope (STM) fabrication. For STM fabrication, we used an STM/scanning electron microscope (SEM) combined with a system operated in high vacuum. The fabrication method is a kind of electrical evaporation with a tungsten (W) tip (top curvature is less than 50 nm). In the first step, a W tip was brought between the split-gate, and then a hole was fabricated by applying a pulse voltage between the W tip and the sample surface. In the second step, a W tip coated with nickel (Ni) was brought near the fabricated hole. Then by applying a pulse voltage between the Ni-coated W tip and sample surface, electrically evaporated Ni from the tip is buried into the hole. In a preliminary measurement at 0.3 K, we obtained the following unique transport properties. In a 4-terminal conductance (G4t) as a function of gate voltage (Vg), we observed a clear 'kink' (an abrupt change of dG4t/dVg and step structures) before full pinch-off of the wire. In both regions of G4t, that is, when Vgk < Vg (before the kink appears) and when Vg < Vgk (after the kink appears) (Vgk is the gate voltage at which the 'kink' appears), some step structures are seen. The step difference (ΔG4t) is, however, different between the two regions. That is, ΔG4t = 2 - 4 × (2e2/h) before the kink appears, while ΔG4t = (1/8) - ( 1/4 ) × (2e2/h) after the kink appears.