比田井 洋史

In this paper, a new, simple, high-speed method of selective metal deposition on glass substrates is proposed. The method is as follows: metal powder is placed on a glass substrate, then an argon ion laser is irradiated through the glass from the other side. Soda glass, Pyrex glass and silica glass were used as substrates, aluminum and copper powders, with grain sizes of 7.0 mum and 4.6 mum, respectively, were chosen. The beam of an argon ion laser (Coherent, DBW20) was used at 488nm wavelength, because the glasses have high transparency of visible light. Both aluminum and copper can be deposited on all the glasses. Aluminum deposited on the soda glass were 80 mum - 800 mum in width and 10 mum - 120 mum in height. The deposited aluminum and copper had high conductivity and resistances of 0.017Omega/mm - 0.64Omega/mm and 0.0014Omega/mm - 0.2Omega/mm, respectively.

Water was used as a substrate and carbon films were obtained from methane gas on the water by ArF excimer laser. The film was analyzed by a SEM, elementary analysis, Raman spectrum and FT-IR. Moreover synthesized position of the film was studied.